Manufacturer : PVD
Role of the equipment
The PVD3000 system is a fully automated pulsed laser deposition system. It allows the deposition of a large number of materials like metals and complex oxydes with an independant control on the deposition temperature and the background pressure (wich can be oxygen, helium, nitrogen, etc...). Compared to conventional PLD systems, the PVD3000 offers a programmable scan rastering of the target and a tight control on the substrate temperature allowing the deposition of thin films on large surfaces (up to 3" or 75mm in diameter).
• Laser Source: PulseMaster 866 from Light Machinery (500mJ, max. 100Hz)
• Graphical interface with automated control of the tool and the possibility to save processes as recipes
Examples of available processes and services
• Deposition of epitaxial ferroelectrics (BST, CBN …)